Wafer cleaning brush cartridge

The scrubber is mainly used for cleaning the silicon wafer after polishing, which can effectively remove the positive and negative sides of the silicon wafer μ M and larger particles. The main configuration includes special scrubber, optimized chemical cleaning solution and ultrapure water or IPA. Under hydrodynamic conditions, particles are driven out by a rotating sponge brush
A typical POST CMP cleaning device includes two scrubbing boxes and a megabrush acoustic cleaning module. The nylon brush used in the early days is easy to cause damage to the silicon chip. Now, polyvinyl alcohol (PVA) brush is generally used, and PVA brush is combined with deionized water,